Construct · 1 fields · 1 citations

aspect ratio dependent etching: a standalone construct

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aspect ratiodependent etching1 CONSTRUCTAspect ratio dependentGOTTSCHO · SEMICONDUCTOR

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Semiconductor manufacturing

slower etching in narrow, deep features than in wide ones, from limited transport of ions and neutrals.

In semiconductor manufacturing, aspect ratio dependent etching refers to slower etching in narrow, deep features than in wide ones, from limited transport of ions and neutrals. This meaning comes from Gottscho (1992) in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena.[1]

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Nearby constructs

aspect4 fields · 4 citationsjingle · one word, four constructsetching3 fields · 4 citationsjingle · one word, three constructsmeasurement3 fields · 5 citationsjingle · one word, three constructs

References

  1. Gottscho, R. A., Jurgensen, C. W., & Vitkavage, D. J. (1992). Microscopic uniformity in plasma etching. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 10(5), 2133-2147. https://doi.org/10.1116/1.586180

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