Construct · 1 fields · 1 citations

atomic layer etching: a standalone construct

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Semiconductor manufacturing

removing material one atomic layer at a time through sequential self-limiting surface modification and removal steps.

In semiconductor manufacturing, atomic layer etching refers to removing material one atomic layer at a time through sequential self-limiting surface modification and removal steps. This meaning comes from Kanarik (2015) in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films.[1]

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Nearby constructs

etching3 fields · 4 citationsjingle · one word, three constructs layer3 fields · 5 citationsjingle · one word, three constructs surface3 fields · 3 citationsjingle · one word, three constructs

References

Kanarik, K. J., Lill, T., Hudson, E. A., Sriraman, S., Tan, S., Marks, J., Vahedi, V., & Gottscho, R. A. (2015). Overview of atomic layer etching in the semiconductor industry. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 33(2). https://doi.org/10.1116/1.4913379

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