Construct · 1 fields · 1 citations

plasma etching: a standalone construct

One name. One construct. A landmark on the map.

● anchor · a standalone construct Nearest construct by meaning·not indexed

A single standalone construct; nearby constructs are located against it in the Collider. Tap a field for its definition, unit, and measures.

Semiconductor manufacturing

removing material with reactive plasma species, where ion bombardment greatly speeds the surface chemistry.

In semiconductor manufacturing, plasma etching refers to removing material with reactive plasma species, where ion bombardment greatly speeds the surface chemistry. This meaning comes from Coburn (1979) in Journal of Applied Physics.[1]

Unit
Recovery means
Measured by

Run it through the Collider, or take the citations with you.

See how plasma etching sits against neighbouring constructs in the Collider, or export every reference on this page in one click.

Open in Collider Export BibTeX Report this entry

Nearby constructs

etching3 fields · 4 citationsjingle · one word, three constructs plasma2 fields · 2 citationsjingle · one word, two constructs species4 fields · 8 citationsjingle · one word, four constructs

References

Coburn, J. W., & Winters, H. F. (1979). Ion- and electron-assisted gas-surface chemistry: An important effect in plasma etching. Journal of Applied Physics, 50(5), 3189-3196. https://doi.org/10.1063/1.326355

Cited on this page?

Confirm your construct, or correct us.

If your work is cited behind one of these entries, you know better than we do whether we captured the meaning right. Confirm it, suggest an edit, or dispute it, and your name goes on the entry as an author who has checked it, linked to your ORCID.

Claim your construct