Construct · 1 fields · 1 citations

Blech length: a standalone construct

One name. One construct. A landmark on the map.

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Microelectronics reliability

the critical line length below which back stress halts electromigration in a metal interconnect, so short lines become immune.

In microelectronics reliability, Blech length refers to the critical line length below which back stress halts electromigration in a metal interconnect, so short lines become immune. This meaning comes from Blech (1976) in Journal of Applied Physics.[1]

Unit
Recovery means
Measured by

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Nearby constructs

electromigration1 fields · 1 citationsanchor · a standalone construct line4 fields · 7 citationsjingle · one word, four constructs reliability3 fields · 5 citationsjingle · one word, three constructs

References

Blech, I. A. (1976). Electromigration in thin aluminum films on titanium nitride. Journal of Applied Physics, 47(4), 1203-1208. https://doi.org/10.1063/1.322842

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