Construct · 1 fields · 1 citations

magnetron sputtering: a standalone construct

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Semiconductor manufacturing

sputter deposition in which magnets confine electrons near the target, raising plasma density and deposition rate.

In semiconductor manufacturing, magnetron sputtering refers to sputter deposition in which magnets confine electrons near the target, raising plasma density and deposition rate. This meaning comes from Kelly (2000) in Vacuum.[1]

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Nearby constructs

density4 fields · 6 citationsjingle · one word, four constructs plasma2 fields · 2 citationsjingle · one word, two constructs raising1 fields · 1 citationsanchor · one construct, one field

References

Kelly, P. J., & Arnell, R. D. (2000). Magnetron sputtering: a review of recent developments and applications. Vacuum, 56(3), 159-172. https://doi.org/10.1016/s0042-207x(99)00189-x

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