Construct · 1 fields · 1 citations

resist: a standalone construct

One name. One construct. A landmark on the map.

● anchor · a standalone construct Nearest construct by meaning·not indexed
resist1 CONSTRUCTPhotoresistMACK · PHOTORESIST

A single standalone construct; nearby constructs are located against it in the Collider. Tap a field for its definition, unit, and measures.

Microfabrication

A patterned film that masks etch or implant

In photolithography a photoresist is a light-sensitive polymer spun onto a wafer and exposed through a mask; development then washes away either the exposed or the unexposed regions, leaving a patterned film that protects the covered areas while etching, ion implantation, or deposition act on the rest. Mack's Fundamental Principles of Optical Lithography sets out how exposure and development define these patterns. Named by direct analogy to the etcher's resist, it is the same masking construct, now at micrometre and nanometre scale.[1]

Unit
Which regions of the wafer the developed film protects
Recovery means
Not applicable
Measured by
Characterised by resolution, contrast, and the fidelity of the developed pattern that masks the next process step

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Nearby constructs

lithography3 fields · 3 citationsinvariant · one construct, three systemsadhesion4 fields · 4 citationsjingle · one word, four constructs

References

  1. Mack, C. A. (2007). Fundamental principles of optical lithography: The science of microfabrication. Wiley. ISBN 9780470018934

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